This lab is constructed with three zones and multi-zones thermal CVDs, plasma enhanced CVD (PECVD) and two single zone tube furnaces for controlled ambient heat treatment. CVDs are designed and optimized for the growth of different 2D chalcogenides which includes sulfides, selenides and tellurides. PECVD is used for plasma treatment of different materials.

This lab is constructed with a high vacuum deposition unit with RF/DC sputtering and thermal/e-beam evaporation along with load lock chamber facility. Vacuum oven is also installed for heat treatment of samples under controlled vacuum ambient.

This lab is constructed with a high vacuum deposition unit with RF/DC sputtering and thermal/e-beam evaporation along with load lock chamber facility. Vacuum oven is also installed for heat treatment of samples under controlled vacuum ambient.

Wire bonding, wafer dicing and film thickness profiling facilities are available in the packaging lab.

Semiconductor parameter analyzer along with probe-station facility is installed for I-V and C-V measurement. Organic vapor generators are installed for characterizing gas/vapor sensors.

Thermal desorption assisted gas chromatography and mass spectroscopy system is installed to analyze gaseous samples along with liquid targets.